Predicting Pulsed-Laser Deposition SrTiO<sub>3</sub> Homoepitaxy Growth Dynamics Using High-Speed Reflection High-Energy Electron Diffraction

Pulsed-laser deposition (PLD) is a powerful technique for growing complex oxides with controlled stoichiometry. To understand growth dynamics therein, it is common to leverage <i>in situ</i> spectroscopies, such as reflection high-energy electron diffraction (RHEED), to monitor surface crystallinity. Most commercial systems rely on video-rate cameras operating at 60-120 Hz that lack sufficient temporal resolution to capture growth dynamics at practical deposition frequencies. Here, a high-speed platform to record <i>in situ</i> dynamics via RHEED at >500 Hz is implemented. An open-source analysis package is designed to fit diffraction spots to 2D Gaussians, allowing single-pulse surface reconstruction kinetics extraction. Using homoepitaxially deposited (001)-oriented SrTiO<sub>3</sub> as a model system, we demonstrate how high-speed RHEED can provide real-time insight into growth processes obscured by slower acquisition systems. By fitting the single-pulse intensity to a set of exponential functions, we observe changes in the characteristic decay time and mechanism correlated to the substrate step width and surface termination. We observe distinct surface effects, with diffraction intensity decaying on lower-energy TiO<sub>2</sub>-terminated surfaces and stabilizing on SrO- or mixed-terminated surfaces. Similarly, using an exponential model, the extracted characteristic time of adatom deposition decreases with increased density of bonding sites associated with mixed termination and narrower step widths. Ultimately, this work shows how increasing RHEED temporal resolution can uncover new insights into growth processes, with practical implications for the design and control of PLD processes. This experimental platform provides new capabilities to enable data-driven machine learning analysis and autonomous control systems to enhance the complexity and fecundity of PLD.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2025-04-08
DOI
https://doi.org/10.1021/acsami.4c12655
Primary Topic
Electronic and Structural Properties of Oxides
Type
article
Field-Weighted Citation Impact
0.00

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article

Predicting Pulsed-Laser Deposition SrTiO3 Homoepitaxy Growth Dynamics Using High-Speed Reflection High-Energy Electron Diffraction

Peter Meisenheimer, Shuyu Qin, R. Ramesh, Julian Goddy et al.
ACS Applied Materials & Interfaces
Electronic and Structural Properties of Oxides
article

Predicting Pulsed-Laser Deposition SrTiO3 Homoepitaxy Growth Dynamics Using High-Speed Reflection High-Energy Electron Diffraction

Peter Meisenheimer, Shuyu Qin, R. Ramesh, Julian Goddy, Lane W. Martin, Joshua Agar, Yichen Guo, Xinqiao Zhang
article en

Abstract

Pulsed-laser deposition (PLD) is a powerful technique for growing complex oxides with controlled stoichiometry. To understand growth dynamics therein, it is common to leverage <i>in situ</i> spectroscopies, such as reflection high-energy electron diffraction (RHEED), to monitor surface crystallinity. Most commercial systems rely on video-rate cameras operating at 60-120 Hz that lack sufficient temporal resolution to capture growth dynamics at practical deposition frequencies. Here, a high-speed platform to record <i>in situ</i> dynamics via RHEED at >500 Hz is implemented. An open-source analysis package is designed to fit diffraction spots to 2D Gaussians, allowing single-pulse surface reconstruction kinetics extraction. Using homoepitaxially deposited (001)-oriented SrTiO<sub>3</sub> as a model system, we demonstrate how high-speed RHEED can provide real-time insight into growth processes obscured by slower acquisition systems. By fitting the single-pulse intensity to a set of exponential functions, we observe changes in the characteristic decay time and mechanism correlated to the substrate step width and surface termination. We observe distinct surface effects, with diffraction intensity decaying on lower-energy TiO<sub>2</sub>-terminated surfaces and stabilizing on SrO- or mixed-terminated surfaces. Similarly, using an exponential model, the extracted characteristic time of adatom deposition decreases with increased density of bonding sites associated with mixed termination and narrower step widths. Ultimately, this work shows how increasing RHEED temporal resolution can uncover new insights into growth processes, with practical implications for the design and control of PLD processes. This experimental platform provides new capabilities to enable data-driven machine learning analysis and autonomous control systems to enhance the complexity and fecundity of PLD.

ACS Applied Materials & InterfacesVol. 17(16)
Lawrence Berkeley National Laboratory (US), Lehigh University (US), University of California System (US), Drexel University (US), Rice University (US)
Division of Materials Research, Office of Advanced Cyberinfrastructure, Advanced Scientific Computing Research, Division of Advanced Cyberinfrastructure, Army Research Office
Affordable and clean energy
Openalex Percentile: Top 95%
Electronic and Structural Properties of Oxides
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