Investigation of Physical Limits of Low Temperature Subthreshold Swing in Indium-Tin-Oxide Transistors

This work investigated the physical limits of subthreshold swing (SS) in indium-tin-oxide (ITO) transistors with temperatures down to 20 K. As the temperature decreases, the ITO transistors first exhibit a significant reduction in SS and reach a common saturated value at temperatures below 77 K for gate dielectrics of 10 nm, 5 nm, and 3 nm HfZrLaO dielectrics. The temperature dependence for SS on temperature for different dielectric thicknesses can be attributed to a transition of the dominant carrier conduction mechanism from percolation conduction (PC) to trap-limited conduction (TLC) as the temperature decreases. Benefiting from the thin dielectric thickness, a short channel 40 nm ITO transistor achieves the highest Q(g<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</sub>/SS) of 9.26 (822 μS/μm / 88.5 mV/dec) at a drain bias voltage of 0.5 V.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-04-07
DOI
https://doi.org/10.1109/led.2025.3556932
Citations
1
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
0.73

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article

Investigation of Physical Limits of Low Temperature Subthreshold Swing in Indium-Tin-Oxide Transistors

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1 citations
IEEE Electron Device Letters
Thin-Film Transistor Technologies
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article

Investigation of Physical Limits of Low Temperature Subthreshold Swing in Indium-Tin-Oxide Transistors

Min Zeng, C.L. Gu, Yanqing Wu, Shenwu Zhu, Tianyue Fu, Qianlan Hu, Qijun Li, Jiyang Kang
article en
1 citations

Abstract

This work investigated the physical limits of subthreshold swing (SS) in indium-tin-oxide (ITO) transistors with temperatures down to 20 K. As the temperature decreases, the ITO transistors first exhibit a significant reduction in SS and reach a common saturated value at temperatures below 77 K for gate dielectrics of 10 nm, 5 nm, and 3 nm HfZrLaO dielectrics. The temperature dependence for SS on temperature for different dielectric thicknesses can be attributed to a transition of the dominant carrier conduction mechanism from percolation conduction (PC) to trap-limited conduction (TLC) as the temperature decreases. Benefiting from the thin dielectric thickness, a short channel 40 nm ITO transistor achieves the highest Q(g<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</sub>/SS) of 9.26 (822 μS/μm / 88.5 mV/dec) at a drain bias voltage of 0.5 V.

IEEE Electron Device LettersVol. 46(6)
Peking University (CN), Wuhan National Laboratory for Optoelectronics (CN), Huazhong University of Science and Technology (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 30%
Thin-Film Transistor Technologies
0.73
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