DTMOS Based Bandgap Reference Design in CMOS 28nm Process

This paper describes design and simulation results of the bandgap reference source in CMOS 28nm technology. Proposed bandgap reference utilizes DTMOS transistors for providing currents of negative and positive temperature coefficients and is equipped with various techniques for process variation minimization such as common centroid element design and user controlled trimming resistors. This circuit achieves temperature coefficient equal to -18.87 ppm/(°C) with temperature ranging from -20°C to 100°C at 1V power supply, occupies 0.38 mm2 of silicon area, and consumes 3.66 μW of power.

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Publication Details

Journal
International Journal of Electronics and Telecommunications
Published
2025-04-07
DOI
https://doi.org/10.24425/ijet.2025.153554
Primary Topic
VLSI and Analog Circuit Testing
Type
article
Field-Weighted Citation Impact
0.00
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article

DTMOS Based Bandgap Reference Design in CMOS 28nm Process

International Journal of Electronics and Telecommunications
VLSI and Analog Circuit Testing
article

DTMOS Based Bandgap Reference Design in CMOS 28nm Process

article en

Abstract

This paper describes design and simulation results of the bandgap reference source in CMOS 28nm technology. Proposed bandgap reference utilizes DTMOS transistors for providing currents of negative and positive temperature coefficients and is equipped with various techniques for process variation minimization such as common centroid element design and user controlled trimming resistors. This circuit achieves temperature coefficient equal to -18.87 ppm/(°C) with temperature ranging from -20°C to 100°C at 1V power supply, occupies 0.38 mm2 of silicon area, and consumes 3.66 μW of power.

International Journal of Electronics and Telecommunications
AGH University of Krakow (PL)
Openalex Percentile: Top 94%
VLSI and Analog Circuit Testing
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DTMOS Based Bandgap Reference Design in CMOS 28nm Process · International Journal of Electronics and Telecommunications (2025) | TGRS Research Map | TGRS