A Novel Method of Adding Sucrose in Fixed Abrasive Pads for Self-Conditioning

A method of self-conditioning a fixed abrasive pad via the dissolution of sugar in bonds was proposed. Self-conditioning means that pads can be dressed by themselves during lapping processing. Self-conditioning experiments were conducted on a series of sucrose resin-based fixed abrasive pads for the lapping of monocrystalline silicon wafers. The material removal rate (MRR), pad wear rate (PWR), machined three-dimensional surface roughness (<i>S</i> <sub>a</sub>), and pad surface topography were measured during lapping experiments. Different self-conditioning rates were realized by regulating the dissolution rate of sucrose in the pad. The maximum MRR reached 18.99 nm/min, and the minimum <i>S</i> <sub>a</sub> value achieved after machining decreased from original 409.8 nm to 64.3 nm. The self-conditioning mechanism of a sucrose-resin-based fixed abrasive pad was illustrated. The microstructure evolution and abrasive wear process on the pad surface under different self-conditioning rates are discussed in detail using a schematic diagram.

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Publication Details

Journal
ACS Omega
Published
2025-04-07
DOI
https://doi.org/10.1021/acsomega.5c00264
Primary Topic
Advanced Surface Polishing Techniques
Type
article
Field-Weighted Citation Impact
0.00

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article

A Novel Method of Adding Sucrose in Fixed Abrasive Pads for Self-Conditioning

Weimin Lin, Shenghao Xiao, Meie Zheng, Yunlong San et al.
ACS Omega
Advanced Surface Polishing Techniques
article

A Novel Method of Adding Sucrose in Fixed Abrasive Pads for Self-Conditioning

Weimin Lin, Shenghao Xiao, Meie Zheng, Yunlong San, Hui Huang, Fei Ma, Wei Xiong
article en

Abstract

A method of self-conditioning a fixed abrasive pad via the dissolution of sugar in bonds was proposed. Self-conditioning means that pads can be dressed by themselves during lapping processing. Self-conditioning experiments were conducted on a series of sucrose resin-based fixed abrasive pads for the lapping of monocrystalline silicon wafers. The material removal rate (MRR), pad wear rate (PWR), machined three-dimensional surface roughness (<i>S</i> <sub>a</sub>), and pad surface topography were measured during lapping experiments. Different self-conditioning rates were realized by regulating the dissolution rate of sucrose in the pad. The maximum MRR reached 18.99 nm/min, and the minimum <i>S</i> <sub>a</sub> value achieved after machining decreased from original 409.8 nm to 64.3 nm. The self-conditioning mechanism of a sucrose-resin-based fixed abrasive pad was illustrated. The microstructure evolution and abrasive wear process on the pad surface under different self-conditioning rates are discussed in detail using a schematic diagram.

ACS OmegaVol. 10(14)
Huaqiao University (CN), EY Technologies (United States) (US), Hubei Engineering University (CN), Fujian Agriculture and Forestry University (CN)
Hubei Provincial Department of Education, Xiaogan Science and Technology Bureau, National Natural Science Foundation of China, Natural Science Foundation of Hubei Province, Program for Changjiang Scholars and Innovative Research Team in University
Zero hunger
Openalex Percentile: Top 94%
Advanced Surface Polishing Techniques
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A Novel Method of Adding Sucrose in Fixed Abrasive Pads for Self-Conditioning — Weimin Lin, Shenghao Xiao, et al. · ACS Omega (2025) | TGRS Research Map | TGRS