Regioselective and Anisotropic Multi‐Patching of Small Microparticles via a Polymer Brush‐Assisted Microcontact Printing (µCP)

Abstract A method for fabricating anisotropic monodisperse silicon dioxide (SiO 2 ) patchy microspheres is developed. In the protocol, we utilize a modified microcontact printing (µCP) technique, employing a polydimethylsiloxane (PDMS) elastomer with a regularly grooved surface topography as a stamp. The stamp's microscale channels create a confined environment for the SiO 2 microspheres, as they match the particle dimensions (≈4 µm). The solid‐phase µCP routine allows for the transfer of functional trialkoxysilanes from the stamp to the particles exclusively at their contact faces. By applying a second stamp to the exposed side of the particles, a fourth patch with different chemical information is added, resulting in particles with four equidistant patches along the particle equator. This fabrication process, compatible with a manifold follow‐up chemistry, adds patches with adjustable characteristics. Consequently, a polymeric material containing the nucleobase adenine, is successfully added to the patches, which enables interactions with materials that possess its complementary base uracil. The method is suitable to fabricate particles possessing a C 4v and C 2v symmetry. Importantly, the protocol is easily adaptable to other particle dimensions and surface chemistry, possessing significant potential in the field of anisotropically functionalized spherical colloidal particles.

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Publication Details

Journal
Advanced Functional Materials
Published
2025-04-05
DOI
https://doi.org/10.1002/adfm.202423495
Citations
3
Primary Topic
Pickering emulsions and particle stabilization
Type
article
Field-Weighted Citation Impact
1.55

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article

Regioselective and Anisotropic Multi‐Patching of Small Microparticles via a Polymer Brush‐Assisted Microcontact Printing (µCP)

Florian Schmitt, Steffen Tank, Martin Reifarth, Alexander Böker et al.
3 citations
Advanced Functional Materials
Pickering emulsions and particle stabilization
1.55
article

Regioselective and Anisotropic Multi‐Patching of Small Microparticles via a Polymer Brush‐Assisted Microcontact Printing (µCP)

Florian Schmitt, Steffen Tank, Martin Reifarth, Alexander Böker, Salvatore Chiantia, Matthias Hartlieb, Richard Grobe, Marcel Sperling, Pinar Akarsu, Katja M. Arndt, Maurice Schmette
article en
3 citations

Abstract

Abstract A method for fabricating anisotropic monodisperse silicon dioxide (SiO 2 ) patchy microspheres is developed. In the protocol, we utilize a modified microcontact printing (µCP) technique, employing a polydimethylsiloxane (PDMS) elastomer with a regularly grooved surface topography as a stamp. The stamp's microscale channels create a confined environment for the SiO 2 microspheres, as they match the particle dimensions (≈4 µm). The solid‐phase µCP routine allows for the transfer of functional trialkoxysilanes from the stamp to the particles exclusively at their contact faces. By applying a second stamp to the exposed side of the particles, a fourth patch with different chemical information is added, resulting in particles with four equidistant patches along the particle equator. This fabrication process, compatible with a manifold follow‐up chemistry, adds patches with adjustable characteristics. Consequently, a polymeric material containing the nucleobase adenine, is successfully added to the patches, which enables interactions with materials that possess its complementary base uracil. The method is suitable to fabricate particles possessing a C 4v and C 2v symmetry. Importantly, the protocol is easily adaptable to other particle dimensions and surface chemistry, possessing significant potential in the field of anisotropically functionalized spherical colloidal particles.

Advanced Functional MaterialsVol. 35(24)
University of Potsdam (DE), Fraunhofer Institute for Applied Polymer Research (DE)
Deutsche Forschungsgemeinschaft, Universität Potsdam, H2020 European Research Council
Openalex Percentile: Top 19%
Pickering emulsions and particle stabilization
1.55
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