Strain and luminescence properties of hexagonal hillocks in N-polar GaN

Owing to its unique properties, N-polar GaN offers several advantages over Ga-polar GaN, particularly for applications in high power electronics. However, the growth of high-quality N-polar material is challenging. One dominant issue is the increased surface roughness, due to the occurrence of hexagonal-shaped hillocks, referred to as hexagons, on the material’s surface. Although there are different methods to reduce the density of these hillocks, such as the use of vicinal substrates or optimum growth conditions, the properties of such hillocks are not extensively studied. Here, we investigate the crystallographic and luminescence properties of these hexagonal features using the techniques of electron backscatter diffraction (EBSD) and cathodoluminescence (CL) hyperspectral imaging in the scanning electron microscope combined with micro-Raman mapping. CL revealed increased light emission from the top of the hexagons compared with the surrounding material. Additionally, dark spots in intensity images, associated with non-radiative recombination at threading dislocations, could be resolved on top of the hexagons, but not in the surrounding area, implying improved material quality of the hexagons. Extensive strain analysis using EBSD revealed that the hexagons are composed of equivalent triangular segments with tensile strain along symmetrically equivalent ⟨112¯0⟩ directions. As the hexagons become larger, this strain increases with the distance from the center. This was confirmed by mapping the Raman E2 (high) mode. Overall, this provides crucial insight into the strain state of these hexagonal features.

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Publication Details

Journal
Journal of Applied Physics
Published
2025-04-03
DOI
https://doi.org/10.1063/5.0259840
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.26

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article

Strain and luminescence properties of hexagonal hillocks in N-polar GaN

Aimo Winkelmann, Robert Martin, Andrei Sarua, Jochen Bruckbauer et al.
1 citations
Journal of Applied Physics
GaN-based semiconductor devices and materials
1.26
article

Strain and luminescence properties of hexagonal hillocks in N-polar GaN

Aimo Winkelmann, Robert Martin, Andrei Sarua, Jochen Bruckbauer, B. Hourahine, Grzegorz Cios, C. Trager‐Cowan, Tao Wang, Peng Feng
article en
1 citations

Abstract

Owing to its unique properties, N-polar GaN offers several advantages over Ga-polar GaN, particularly for applications in high power electronics. However, the growth of high-quality N-polar material is challenging. One dominant issue is the increased surface roughness, due to the occurrence of hexagonal-shaped hillocks, referred to as hexagons, on the material’s surface. Although there are different methods to reduce the density of these hillocks, such as the use of vicinal substrates or optimum growth conditions, the properties of such hillocks are not extensively studied. Here, we investigate the crystallographic and luminescence properties of these hexagonal features using the techniques of electron backscatter diffraction (EBSD) and cathodoluminescence (CL) hyperspectral imaging in the scanning electron microscope combined with micro-Raman mapping. CL revealed increased light emission from the top of the hexagons compared with the surrounding material. Additionally, dark spots in intensity images, associated with non-radiative recombination at threading dislocations, could be resolved on top of the hexagons, but not in the surrounding area, implying improved material quality of the hexagons. Extensive strain analysis using EBSD revealed that the hexagons are composed of equivalent triangular segments with tensile strain along symmetrically equivalent ⟨112¯0⟩ directions. As the hexagons become larger, this strain increases with the distance from the center. This was confirmed by mapping the Raman E2 (high) mode. Overall, this provides crucial insight into the strain state of these hexagonal features.

Journal of Applied PhysicsVol. 137(13)
Jagiellonian University (PL), University of Strathclyde (GB), University of Bristol (GB), AGH University of Krakow (PL), Cardiff University (GB), University of Sheffield (GB)
Royal Society of Edinburgh, Narodowe Centrum Nauki, Engineering and Physical Sciences Research Council
Openalex Percentile: Top 23%
GaN-based semiconductor devices and materials
1.26
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