Breakdown Criteria Selection for Analyzing Advanced Node High-K TDDB Stress Data

Gate oxide breakdown in advanced node high-k devices often occur progressively or in successive steps. Due to this complication, selecting criteria to determine breakdown is a topic of discussion with the assumption that end results would be affected. This work investigates how breakdown criteria would affect the Weibull fitting results and model parameters such as voltage acceleration and projected max use voltage. It was found that there is a range of criteria where model parameters become independent of the criteria selection. Using a criterion within this range would provide consistency in the outcome of reliability studies.

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Published
2024-10-06
DOI
https://doi.org/10.1109/iirw62856.2024.10947138
Primary Topic
Advanced Data Storage Technologies
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article
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article

Breakdown Criteria Selection for Analyzing Advanced Node High-K TDDB Stress Data

B.P. Linder, Giuseppe La Rosa, Baozhen Li, Byung-Hwan Chu
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Advanced Data Storage Technologies
article

Breakdown Criteria Selection for Analyzing Advanced Node High-K TDDB Stress Data

B.P. Linder, Giuseppe La Rosa, Baozhen Li, Byung-Hwan Chu
article en

Abstract

Gate oxide breakdown in advanced node high-k devices often occur progressively or in successive steps. Due to this complication, selecting criteria to determine breakdown is a topic of discussion with the assumption that end results would be affected. This work investigates how breakdown criteria would affect the Weibull fitting results and model parameters such as voltage acceleration and projected max use voltage. It was found that there is a range of criteria where model parameters become independent of the criteria selection. Using a criterion within this range would provide consistency in the outcome of reliability studies.

IBM (United States) (US), IBM Research - Thomas J. Watson Research Center (US)
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Advanced Data Storage Technologies
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