Correlation between structural properties and electrochemical proton insertion in (001) VO<sub>2</sub> epitaxial films
Abstract We epitaxially grew rutile-structured VO 2 films with various out-of-plane lattice constants on (001) TiO 2 substrates by pulsed laser deposition and investigated their protonation by electrochemically injecting protons to the films in transistor structures with gate layers of proton conducting Nafion membranes. We found that VO 2 films with out-of-plane lattice expansion are less protonated. On the basis of the experimental results, we discuss the correlation between the out-of-plane lattice expansion and protonation of (001) VO 2 epitaxial films and highlight that reducing lattice defects is key to promoting the protonation of VO 2 films.
Authors
- T. Majima (ORCID: https://orcid.org/0000-0003-2804-1915)
- Yuichi Shimakawa (ORCID: https://orcid.org/0000-0003-1019-2512)
- Daisuke Kan (ORCID: https://orcid.org/0000-0002-7505-0059)
- Sota Fuji
- Mitsutaka Haruta (ORCID: https://orcid.org/0000-0002-2237-7242)
- Yosuke Isoda (ORCID: https://orcid.org/0000-0003-4445-9908)
- Xie Lingling
Institutions
- Kyoto University (JP)
- Kyoto Bunkyo University (JP)
- Kyoto University Institute for Chemical Research
Publication Details
- Journal
- Applied Physics Express
- Published
- 2025-04-01
- DOI
- https://doi.org/10.35848/1882-0786/adc8f9
- Citations
- 1
- Primary Topic
- Transition Metal Oxide Nanomaterials
- Type
- article
- Field-Weighted Citation Impact
- 0.61