Optimizing Pulse Conditions for Enhanced Memory Performance of Se-Based Selector-Only Memory

In this study, we investigated the effect of pulse falling time (Tfall) on the electrical characteristics of SiGeAsSebased selector-only memory (SOM) devices. Our experimental results demonstrate that increasing the Tfall leads to an increased threshold voltage (Vth) and reduced Vth drift in SiGeAsSe devices. The optimized devices exhibit a remarkable memory window (> 1 V) and significantly suppressed drift characteristics ( 10 mV/dec.). Electrical measurements at high temperatures demonstrate that Tfall is one of the important factors in material relaxation, and these improvements are attributed to the intentionally induced reconfiguration of the chalcogenide film. Furthermore, our results reveal that a suitable Tfall can effectively mitigate the degradation of the memory window at high temperatures. These findings afford valuable insights into the role of material relaxation in SOM devices, potentially aiding the development of high-performance memory devices.

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Publication Details

Journal
IEEE Journal of the Electron Devices Society
Published
2025-01-01
DOI
https://doi.org/10.1109/jeds.2025.3557732
Citations
1
Primary Topic
Phase-change materials and chalcogenides
Type
article
Field-Weighted Citation Impact
0.52
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Optimizing Pulse Conditions for Enhanced Memory Performance of Se-Based Selector-Only Memory

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Optimizing Pulse Conditions for Enhanced Memory Performance of Se-Based Selector-Only Memory

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article en
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Abstract

In this study, we investigated the effect of pulse falling time (Tfall) on the electrical characteristics of SiGeAsSebased selector-only memory (SOM) devices. Our experimental results demonstrate that increasing the Tfall leads to an increased threshold voltage (Vth) and reduced Vth drift in SiGeAsSe devices. The optimized devices exhibit a remarkable memory window (> 1 V) and significantly suppressed drift characteristics ( 10 mV/dec.). Electrical measurements at high temperatures demonstrate that Tfall is one of the important factors in material relaxation, and these improvements are attributed to the intentionally induced reconfiguration of the chalcogenide film. Furthermore, our results reveal that a suitable Tfall can effectively mitigate the degradation of the memory window at high temperatures. These findings afford valuable insights into the role of material relaxation in SOM devices, potentially aiding the development of high-performance memory devices.

IEEE Journal of the Electron Devices SocietyVol. 13
Pohang University of Science and Technology (KR), IMEC (BE)
Affordable and clean energy
Openalex Percentile: Top 40%
Phase-change materials and chalcogenides
0.52
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