The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films

Tantalum metal and tantalum oxide thin films are commonly used in semiconductor devices, protective coatings, and biomedical implants. However, there is limited information on their nanotribological behavior and small-scale mechanical properties. This study characterized the chemical, mechanical, and tribological properties of as-deposited and 400 °C annealed β-Ta thin films using nanoindentation and atomic force microscope (AFM)-based nanoscale friction and wear tests. X-ray photoelectron spectroscopy (XPS) results revealed that a thermally grown Ta oxide layer forms on the surface of Ta film after being annealed at 400 °C. The nanoindentation data indicated an increase in both the hardness and elastic modulus in the heat-treated sample compared to the as-deposited Ta film (13.1 ± 1.3 GPa vs. 12.0 ± 1.4 GPa for hardness) and (213.1 ± 12.7 GPa vs. 175.2 ± 12.3 GPa for elastic modulus). Our nanotribological results show that the friction increased and wear resistance decreased on the surface of the annealed sample compared to the as-deposited Ta film. This discrepancy may be caused by the oxidation of Ta on the film surface, which induces residual compressive stresses in the film and degrades its wear resistance. Our results highlight the influence of thermal annealing and oxidation on nanotribological behavior and small-scale mechanical properties of Ta thin films.