Effect of Substrate Negative Bias on the Composition and Structure of nc-Cu/a-C:H Nanocomposite Films Deposited by FCVA
Copper-doped hydrogenated amorphous carbon (Cu-doped a-C:H) films were synthesized using copper as the cathode and C2H2 as the precursor. The result shows that the negative bias voltage can affect the composition and microstructure of nanocomposite films. With bias voltage increasing, Cu content first increases in the range of 50~300 V and then declines with higher voltage, while the deposition rate decreases continuously. The stress and sp3 content present a similar trend with the bias voltage, increasing during the range from 50 V to 200 V and then decreasing with higher voltage.
Authors
- Qingyan Hou (ORCID: https://orcid.org/0000-0001-9036-6177)
- Pan Pang
- Xiaoyue Jin (ORCID: https://orcid.org/0000-0001-8060-9710)
- Lin Chen (ORCID: https://orcid.org/0000-0002-8233-800X)
- Bin Liao (ORCID: https://orcid.org/0000-0003-1853-7570)
- Qianli Ma (ORCID: https://orcid.org/0000-0002-7044-8172)
- Yifan Zhang (ORCID: https://orcid.org/0000-0002-1542-2957)
- Xiao Ouyang (ORCID: https://orcid.org/0000-0001-8791-2499)
- Xu Zhang
- Shuai Wu (ORCID: https://orcid.org/0009-0004-3938-1573)
Institutions
- Beijing Normal University (CN)
- Beijing Academy of Science and Technology (CN)
Publication Details
- Journal
- Coatings
- Published
- 2025-04-02
- DOI
- https://doi.org/10.3390/coatings15040424
- Primary Topic
- Diamond and Carbon-based Materials Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00