Wide-Angle, Polarization-Independent Broadband Metamaterial Absorber by Using Plasmonic Metasurface-Based Split-Circular Structure
Absorption of electromagnetic waves in a broadband frequency range with polarization insensitivity and wide incidence angles is greatly needed in modern technological applications. Many methods using metamaterials have been suggested to address this requirement; they can be complex multilayer structures or use external electronic components. In this paper, we present a plasmonic metasurface structure that was simply fabricated using the standard printed circuit board technique but provided a high absorption above 90%, also covering a broadband frequency range from 12.30 to 14.80 GHz. This plasmonic metasurface consisted of structural unit cells composed of multiple split rings connected by a copper bar. Analysis, simulation, and measurement results showed that the metasurface also showed polarization-insensitive properties and maintained an absorption above 90% at incident angles up to 45 degrees. The suggested plasmonic metasurface is a fundamental design that can also be used to design the absorber in different frequency ranges and is able to adapt well to being fabricated at various scales.
Authors
- YoungPak Lee (ORCID: https://orcid.org/0000-0001-7601-6437)
- Thanh Son Pham (ORCID: https://orcid.org/0000-0002-3608-5929)
- Bùi Xuân Khuyến (ORCID: https://orcid.org/0000-0002-7817-3505)
- Liang‐Yao Chen
- Vũ Đình Lãm (ORCID: https://orcid.org/0000-0002-8067-1503)
Institutions
- Fudan University (CN)
- Hanyang University (KR)
- Hanoi University of Industry (VN)
- Vietnam Academy of Science and Technology (VN)
Publication Details
- Journal
- Photonics
- Published
- 2025-04-02
- DOI
- https://doi.org/10.3390/photonics12040334
- Citations
- 5
- Primary Topic
- Metamaterials and Metasurfaces Applications
- Type
- article
- Field-Weighted Citation Impact
- 2.14
Funders
- Vietnam Academy of Science and Technology
- Science and Technology Commission of Shanghai Municipality
- Korea Evaluation Institute of Industrial Technology