Development of LiF_<i>x</i>/Al₂O₃/ITO Multilayer Antireflection Coatings for Reflectance Reduction in Silicon Heterojunction Solar Cells

This study focuses on the optimization of antireflection coatings (ARCs) to enhance the performance of silicon heterojunction (SHJ) solar cells. SHJ solar cells face a significant challenge in achieving their theoretical efficiency limits due to light reflection at the air–cell interface. This reflection reduces photon absorption, which limits photocurrent generation and hinders the widespread adoption of SHJ technology. To address this, the optimization of ARCs using single, double, and triple‐layer designs with a graded refractive index material as the active layer is investigated. The optimization process is simulated by calculating the layer thicknesses using OPAL2 software and validated through experimental deposition. The results demonstrate that a triple‐layer ARC structure consisting of 80/50/95 nm of indium tin oxide (ITO), aluminum oxide (Al 2 O 3 ), and lithium fluoride (LiF x ) significantly improves SHJ performance. This configuration leads to a 1.04 mA cm −2 increase in short‐circuit current density ( J sc ), reaching 39.85 mA cm −2 , and an efficiency of 21.62%, compared to a single‐layer ARC. This study presents a promising solution to improve SHJ solar cell efficiency by reducing reflection losses and optimizing optical properties, contributing to the advancement of SHJ technology and facilitating the development of more efficient and cost‐effective photovoltaic systems for sustainable energy transition.