Dual alkali etching for osseointegration and reduced bacterial adhesion: a feasible alternative to SLA
A room temperature dual alkaline surface modification technique was performed on Ti-6Al-4V implants. This approach established a simple method for achieving osseointegration, while also enhancing the bacteriostatic nature of the material.
Authors
- Wei Xia
- Håkan Engqvist (ORCID: https://orcid.org/0000-0001-9529-650X)
- Deepa Seetharaman (ORCID: https://orcid.org/0000-0002-2267-8635)
- Wei Zhu (ORCID: https://orcid.org/0000-0002-9221-1125)
- Sushmita Chettri
- Zhou Huasi
Institutions
- Uppsala University (SE)
- Chinese Academy of Medical Sciences & Peking Union Medical College (CN)
- Peking Union Medical College Hospital (CN)
- Sri Sathya Sai Institute of Higher Learning (IN)
Publication Details
- Journal
- Materials Advances
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d4ma01223b
- Primary Topic
- Oral and gingival health research
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Vetenskapsrådet