Effect of SiNx/SiO2 Passivation Layers on Diffused Front Surface Field in n-type Silicon Wafers

Journal of Nano- and Electronic Physics. Scientific journal. ISSN: 2077-6772. Journal abbreviation: J. Nano- Electron. Phys. No page charges. All articles are freely available on-line. Issued 4 times per year. Publisher: Sumy State University. (Sumy, Ukraine)

Authors

A. Boucheham (ORCID: https://orcid.org/0000-0001-5593-6250)
A. Djelloul (ORCID: https://orcid.org/0000-0002-2226-1987)
B. Labdelli
L. Benharrat (ORCID: https://orcid.org/0000-0002-6617-2222)
Salim Lamri
N. Chahinez
M. Alloun

Publication Details

Journal: Journal of Nano- and Electronic Physics
Published: 2025-01-01
DOI: https://doi.org/10.21272/jnep.17(1).01002
Primary Topic: Silicon and Solar Cell Technologies
Type: article
Field-Weighted Citation Impact: 0.00

Controls

|||

ALL TIME

JAN

FEB

MAR

APR

MAY

JUN

JUL

AUG

SEP

OCT

article

Effect of SiNx/SiO2 Passivation Layers on Diffused Front Surface Field in n-type Silicon Wafers

A. Boucheham, A. Djelloul, B. Labdelli, L. Benharrat et al.

Jan 1, 2025

Journal of Nano- and Electronic Physics

Silicon and Solar Cell Technologies

article

Effect of SiNx/SiO2 Passivation Layers on Diffused Front Surface Field in n-type Silicon Wafers

A. Boucheham, A. Djelloul, B. Labdelli, L. Benharrat, Salim Lamri, N. Chahinez, M. Alloun

January 1, 2025article en

Abstract

Journal of Nano- and Electronic PhysicsVol. 17(1)

Openalex Percentile: Top 95%

Silicon and Solar Cell Technologies

DOI Open Access PDF OpenAlex

AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.

Effect of SiNx/SiO2 Passivation Layers on Diffused Front Surface Field in n-type Silicon Wafers — A. Boucheham, A. Djelloul, et al. · Journal of Nano- and Electronic Physics (2025) | TGRS Research Map | TGRS