5009‐ppi, 10000‐cd/m <sup>2</sup> , OLED/OS/Si structure display with built‐in CPU and display driver
Abstract This study developed an organic light‐emitting diode display featuring c‐axis‐aligned crystalline oxide semiconductor (CAAC‐OS) field‐effect transistors (FETs) monolithically stacked over silicon (Si) FETs. This display achieved a definition of 5,009 ppi and a luminance of 10,000 cd/m 2 . Below the display pixels incorporating CAAC‐OS FETs, both source and scan drivers and a central processing unit (CPU; Cortex‐M0) were integrated using Si FETs without widening the bezel. The findings indicate that the built‐in CPU enables amplifier offset compensation, which is necessary for image quality correction, and that functional circuits beyond the display driver can operate on a Si substrate.
Authors
- Masahiro Katayama
- Yuto Yakubo
- Yuki Tamatsukuri
- Tsutomu Murakawa (ORCID: https://orcid.org/0000-0001-5761-866X)
- Toshihiko Saito (ORCID: https://orcid.org/0000-0002-8318-7944)
- Hidetomo Kobayashi
- Yutaka Okazaki (ORCID: https://orcid.org/0000-0003-2261-5914)
- Daiki Nakamura
- Yasumasa Yamane (ORCID: https://orcid.org/0009-0008-3519-6687)
- Shoki Miyata
- Shunpei Yamazaki (ORCID: https://orcid.org/0000-0001-6055-8987)
- Yuichi Yanagisawa (ORCID: https://orcid.org/0000-0002-8464-9549)
- Toshiyuki Isa
- Munehiro Kozuma (ORCID: https://orcid.org/0009-0002-3835-2899)
- Takaaki Nagata
- Masashi Fujita (ORCID: https://orcid.org/0000-0001-5661-1415)
- Toshihiko Takeuchi (ORCID: https://orcid.org/0000-0002-8356-8923)
- Minato Ito
- Akitsugu Miyairi
Institutions
- Semiconductor Energy Laboratory (Japan) (JP)
Publication Details
- Journal
- Journal of the Society for Information Display
- Published
- 2025-03-29
- DOI
- https://doi.org/10.1002/jsid.2058
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00