Femtosecond laser writing of silicon vacancy color centers with specific defect orientations in silicon carbide

High yield and precise spatial controllability of silicon vacancies can be achieved using femtosecond laser processing. Selective fabrication of V2 color centers is attainable under specific parameter conditions.

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Publication Details

Journal
Journal of Materials Chemistry C
Published
2025-01-01
DOI
https://doi.org/10.1039/d5tc00336a
Citations
1
Primary Topic
Laser Material Processing Techniques
Type
article
Field-Weighted Citation Impact
1.33
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article

Femtosecond laser writing of silicon vacancy color centers with specific defect orientations in silicon carbide

Tian Cheng-rui, Qingbo Li, Xian Zhao, Junlei Wang et al.
1 citations
Journal of Materials Chemistry C
Laser Material Processing Techniques
1.33
article

Femtosecond laser writing of silicon vacancy color centers with specific defect orientations in silicon carbide

Tian Cheng-rui, Qingbo Li, Xian Zhao, Junlei Wang, xiaoqing liu, Yan Li, Yan Liu, Runsheng Zheng
article en
1 citations

Abstract

High yield and precise spatial controllability of silicon vacancies can be achieved using femtosecond laser processing. Selective fabrication of V2 color centers is attainable under specific parameter conditions.

Journal of Materials Chemistry CVol. 13(18)
Shandong University (CN), Ministry of Education (ME)
Openalex Percentile: Top 25%
Laser Material Processing Techniques
1.33
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