Epitaxial growth of high-density homogenous BiFeO ₃ nanoislands

BiFeO 3 (BFO) nanoislands have attracted considerable attention in recent years due to their unique topological domain structures, electric-controllable domain-wall conduction and broadband photoelectric response. However, the realization of high-performance applications of BFO nanoislands requires the development of effective fabrication methods to produce high-density, uniformly sized nanoisland arrays. In this work, we present a systematic study on the growth of BFO nanoislands via pulsed laser deposition (PLD), demonstrating the successful preparation of high-density and highly uniform self-assembled nanoisland arrays. By optimizing key processing parameters, such as growth oxygen pressure, annealing temperature and annealing time, we can control both the density and size distribution of the BFO nanoislands. This study offers a promising route to enhance the performance of ferroelectric devices, paving the way for their potential applications in advanced functional devices.