Surge Current Capability and Failure Modes of 650 V p-GaN Gate HEMTs: A Multiphysics Study on Thermal–Electrical Coupling Effects

In this study, we present a comprehensive comparative analysis of the surge current capability in the third quadrant for four commercial 650 V p-GaN gate HEMTs. Temperature-dependent experiments reveal varying degrees of negative correlation between surge current capability and device junction temperature across the four devices. Gate leakage testing and the decapsulation of failed devices identified two distinct failure modes. Through failure analysis techniques and TCAD simulations, the characteristics of these failure modes were thoroughly revealed. For Failure Mode I, the combined impact of electrical and thermal stress during the surge current process leads to extensive damage in the upper interconnect metal layer. For Failure Mode II, degradation of the metal to p-GaN Schottky contact under a strong electric field causes a rapid increase in the gate current, and the high gate current, coupled with the strong electric field, results in severe electromigration of the gate metal. Among the four tested devices, those exhibiting higher surge energy are more prone to gate damage, making them more susceptible to Failure Mode II.

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Publication Details

Journal
Electronics
Published
2025-03-27
DOI
https://doi.org/10.3390/electronics14071321
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.00

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article

Surge Current Capability and Failure Modes of 650 V p-GaN Gate HEMTs: A Multiphysics Study on Thermal–Electrical Coupling Effects

Kuangli Chen, Shu-Ting Huang, Enchuan Duan, Qi Zhou et al.
Electronics
GaN-based semiconductor devices and materials
article

Surge Current Capability and Failure Modes of 650 V p-GaN Gate HEMTs: A Multiphysics Study on Thermal–Electrical Coupling Effects

Kuangli Chen, Shu-Ting Huang, Enchuan Duan, Qi Zhou, Bo Zhang, Jianggen Zhu, Long Wang, Ruijue Peng
article en

Abstract

In this study, we present a comprehensive comparative analysis of the surge current capability in the third quadrant for four commercial 650 V p-GaN gate HEMTs. Temperature-dependent experiments reveal varying degrees of negative correlation between surge current capability and device junction temperature across the four devices. Gate leakage testing and the decapsulation of failed devices identified two distinct failure modes. Through failure analysis techniques and TCAD simulations, the characteristics of these failure modes were thoroughly revealed. For Failure Mode I, the combined impact of electrical and thermal stress during the surge current process leads to extensive damage in the upper interconnect metal layer. For Failure Mode II, degradation of the metal to p-GaN Schottky contact under a strong electric field causes a rapid increase in the gate current, and the high gate current, coupled with the strong electric field, results in severe electromigration of the gate metal. Among the four tested devices, those exhibiting higher surge energy are more prone to gate damage, making them more susceptible to Failure Mode II.

ElectronicsVol. 14(7)
University of Electronic Science and Technology of China (CN)
National Natural Science Foundation of China, National Key Research and Development Program of China, Basic and Applied Basic Research Foundation of Guangdong Province
Openalex Percentile: Top 96%
GaN-based semiconductor devices and materials
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