Analytical modeling of fringe capacitance in opposite-doped core-shell junctionless nanowire FET

Abstract An analytical model of Oppositely Doped Core–Shell Junctionless Nanowire Field Effect Transistor (ODCS-JL-NWFET) using surface potential is proposed in this paper. The model incorporates the influence of fringe capacitance through the gate sidewall spacer on the potential distribution function. The analytical results align well with simulated outcomes across various ODCS-JL-NWFET physical parameters, such as threshold voltage, drain current, and subthreshold slope. Furthermore, the model illustrates the impact of channel length scaling on device parameters for different core thicknesses, spacer materials, and core doping concentrations. The results demonstrate that optimizing core thickness, spacer material, and core doping concentration selection can significantly reduce leakage current and subthreshold slope, offering valuable insights for designing at smaller technology nodes with low-power applications.

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Publication Details

Journal
Engineering Research Express
Published
2025-03-27
DOI
https://doi.org/10.1088/2631-8695/adc0ec
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
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article

Analytical modeling of fringe capacitance in opposite-doped core-shell junctionless nanowire FET

Bharti Bharti, Poornima Mittal
Engineering Research Express
Advancements in Semiconductor Devices and Circuit Design
article

Analytical modeling of fringe capacitance in opposite-doped core-shell junctionless nanowire FET

Bharti Bharti, Poornima Mittal
article en

Abstract

Abstract An analytical model of Oppositely Doped Core–Shell Junctionless Nanowire Field Effect Transistor (ODCS-JL-NWFET) using surface potential is proposed in this paper. The model incorporates the influence of fringe capacitance through the gate sidewall spacer on the potential distribution function. The analytical results align well with simulated outcomes across various ODCS-JL-NWFET physical parameters, such as threshold voltage, drain current, and subthreshold slope. Furthermore, the model illustrates the impact of channel length scaling on device parameters for different core thicknesses, spacer materials, and core doping concentrations. The results demonstrate that optimizing core thickness, spacer material, and core doping concentration selection can significantly reduce leakage current and subthreshold slope, offering valuable insights for designing at smaller technology nodes with low-power applications.

Engineering Research ExpressVol. 7(1)
Delhi Technological University (IN)
Openalex Percentile: Top 95%
Advancements in Semiconductor Devices and Circuit Design
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