10-second Cu/Polymer Hybrid Bonding Using Area-Selective Metal Passivation for 3D Integration

This study presents the development of a Cu/polymer hybrid bonding process achieving 10 seconds of bonding duration at low temperatures (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$150~^{\circ }$ </tex-math></inline-formula>C to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$200~^{\circ }$ </tex-math></inline-formula>C). Key innovations include a polymer material enabling rapid bonding (<10 seconds) and an electroless deposition (ELD) passivation layer, which can not only lower the bonding duration and temperature but also optimize the height alignment between Cu pads and polymer. Electrical characterization demonstrated stable specific contact resistance as low as <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${3}\times {10}^{-{9}}\Omega \cdot $ </tex-math></inline-formula>cm2, with higher bonding temperatures yielding more consistent electrical properties. Furthermore, Daisy chain measurement and cross-sectional SEM analysis confirmed bonding and signal integrity across varying contact nodes. This work highlights the potential of Cu/polymer hybrid bonding for high-throughput and high-performance applications, addressing key bonding reliability and manufacturing efficiency challenges.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-03-26
DOI
https://doi.org/10.1109/led.2025.3554768
Citations
2
Primary Topic
3D IC and TSV technologies
Type
article
Field-Weighted Citation Impact
1.46
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article

10-second Cu/Polymer Hybrid Bonding Using Area-Selective Metal Passivation for 3D Integration

Kuan‐Neng Chen, Hsiao-Wei Yeh, Makiko Irie, Kazuaki Ebisawa et al.
2 citations
IEEE Electron Device Letters
3D IC and TSV technologies
1.46
article

10-second Cu/Polymer Hybrid Bonding Using Area-Selective Metal Passivation for 3D Integration

Kuan‐Neng Chen, Hsiao-Wei Yeh, Makiko Irie, Kazuaki Ebisawa, Yen Chuang, Satoshi Fujimura, Yu-Lun Liu, Tzu-Yu Chen
article en
2 citations

Abstract

This study presents the development of a Cu/polymer hybrid bonding process achieving 10 seconds of bonding duration at low temperatures (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$150~^{\circ }$ </tex-math></inline-formula>C to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$200~^{\circ }$ </tex-math></inline-formula>C). Key innovations include a polymer material enabling rapid bonding (<10 seconds) and an electroless deposition (ELD) passivation layer, which can not only lower the bonding duration and temperature but also optimize the height alignment between Cu pads and polymer. Electrical characterization demonstrated stable specific contact resistance as low as <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${3}\times {10}^{-{9}}\Omega \cdot $ </tex-math></inline-formula>cm2, with higher bonding temperatures yielding more consistent electrical properties. Furthermore, Daisy chain measurement and cross-sectional SEM analysis confirmed bonding and signal integrity across varying contact nodes. This work highlights the potential of Cu/polymer hybrid bonding for high-throughput and high-performance applications, addressing key bonding reliability and manufacturing efficiency challenges.

IEEE Electron Device LettersVol. 46(5)
National Yang Ming Chiao Tung University (TW), Tokyo Ohka Kogyo (Japan) (JP)
Openalex Percentile: Top 19%
3D IC and TSV technologies
1.46
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10-second Cu/Polymer Hybrid Bonding Using Area-Selective Metal Passivation for 3D Integration — Kuan‐Neng Chen, Hsiao-Wei Yeh, et al. · IEEE Electron Device Letters (2025) | TGRS Research Map | TGRS