AI-Powered Very-High-Cycle Fatigue Control: Optimizing Microstructural Design for Selective Laser Melted Ti-6Al-4V

Integrating machine learning into additive manufacturing offers transformative opportunities to optimize material properties and design high-performance, fatigue-resistant structures for critical applications in aerospace, biomedical, and structural engineering. This study explores mechanistic machine learning techniques to tailor microstructural features, leveraging data from ultrasonic fatigue tests where very high cycle fatigue properties were assessed up to 1×1010 cycles. Machine learning models predicted critical fatigue thresholds, optimized process parameters, and reduced design iteration cycles by over 50%, leading to faster production of safer, more durable components. By refining grain orientation and phase uniformity, fatigue crack propagation resistance improved by 20-30%, significantly enhancing fatigue life and reliability for mission-critical aerospace components, such as turbine blades and structural airframe parts, in an industry where failure is not an option. Additionally, the machine learning-driven design of metamaterials enabled structures with a 15% weight reduction and improved yield strength, demonstrating the feasibility of bioinspired geometries for lightweight applications in space exploration, medical implants, and high-performance automotive components. In the area of titanium and aluminum alloys, machine learning identified key process parameters such as temperature gradients and cooling rates, which govern microstructural evolution and enable fatigue-resistant designs tailored for high-stress environments in aircraft, biomedical prosthetics, and high-speed transportation. Combining theoretical insights and experimental validations, this research highlights the potential of machine learning to refine microstructural properties and establish intelligent, adaptive manufacturing systems, ensuring enhanced reliability, performance, and efficiency in cutting-edge engineering applications.