Errata: “Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching” [J. Vac. Sci. Technol. A 43, 023007 (2025)]

Authors

Esben W. Larsen (ORCID: https://orcid.org/0000-0002-6294-0896)
Shikhar Arvind (ORCID: https://orcid.org/0000-0002-4748-7763)
Stefan De Gendt (ORCID: https://orcid.org/0000-0003-3775-3578)
Roberto Fallica (ORCID: https://orcid.org/0000-0003-4523-9624)
John S. Petersen (ORCID: https://orcid.org/0000-0003-4815-3770)
Philippe Bézard (ORCID: https://orcid.org/0000-0003-2499-0240)

Institutions

Imec the Netherlands (NL)
KU Leuven (BE)

Publication Details

Journal: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Published: 2025-03-25
DOI: https://doi.org/10.1116/6.0004555
Primary Topic: Advancements in Photolithography Techniques
Type: article
Field-Weighted Citation Impact: 0.00

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article

Errata: “Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching” [J. Vac. Sci. Technol. A 43, 023007 (2025)]

Esben W. Larsen, Shikhar Arvind, Stefan De Gendt, Roberto Fallica et al.

Mar 25, 2025

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Advancements in Photolithography Techniques

article

Errata: “Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching” [J. Vac. Sci. Technol. A 43, 023007 (2025)]

Esben W. Larsen, Shikhar Arvind, Stefan De Gendt, Roberto Fallica, John S. Petersen, Philippe Bézard

March 25, 2025article en

Abstract

No abstract available for this paper.

Journal of Vacuum Science & Technology A Vacuum Surfaces and FilmsVol. 43(3)

Imec the Netherlands (NL), KU Leuven (BE)

Openalex Percentile: Top 95%

Advancements in Photolithography Techniques

DOI Open Access PDF OpenAlex

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