Outside Front Cover: Low Temperature Atomic Layer Deposition of (00l)‐Oriented Elemental Bismuth (Angew. Chem. 15/2025)
The first successful growth of elemental bismuth (Bi) thin films via thermal atomic layer deposition (ALD) using Bi(NMe2)3 and Sb(SiMe3)3 is reported by Kornelius Nielsch, Amin Bahrami et al. in their Research Article (e202422578) As depicted on the cover picture, the films evolve from island formation to full coverage, accompanied by a preferential growth shift from the (012) to the (003) plane. The resulting films exhibit semimetallic behavior with a resistivity of approximately 200 µΩ·cm. Artwork by the team of INMYWORK Studio.
Authors
- Panpan Zhao (ORCID: https://orcid.org/0000-0001-7579-0033)
- Kornelius Nielsch (ORCID: https://orcid.org/0000-0003-2271-7726)
- Annalisa Acquesta (ORCID: https://orcid.org/0000-0002-8351-5063)
- Filip Bureš (ORCID: https://orcid.org/0000-0002-2832-6673)
- Antonio Amoroso (ORCID: https://orcid.org/0000-0002-9437-9407)
- Nicolás Pérez (ORCID: https://orcid.org/0000-0002-8312-1662)
- Sebastian Lehmann (ORCID: https://orcid.org/0000-0001-7913-9387)
- Jaroslav Charvot (ORCID: https://orcid.org/0000-0002-7811-015X)
- Jun Yang (ORCID: https://orcid.org/0000-0002-0596-1279)
- Amin Bahrami (ORCID: https://orcid.org/0000-0001-8851-7351)
- Jorge Luis Vázquez Arce (ORCID: https://orcid.org/0000-0003-3651-3193)
- Fabian Pieck (ORCID: https://orcid.org/0000-0001-6912-2725)
- Yana Vaynzof (ORCID: https://orcid.org/0000-0002-0783-0707)
- D. Hansen
- Anjana Devi (ORCID: https://orcid.org/0000-0003-2142-8105)
- Ralf Tonner Zech
- Angelika Wrzesińska Lashkova
Institutions
- University of Pardubice (CZ)
- Leibniz Institute for Solid State and Materials Research (DE)
- University of Naples Federico II (IT)
- Technische Universität Dresden (DE)
- Ruhr University Bochum (DE)
- Leipzig University (DE)
Publication Details
- Journal
- Angewandte Chemie
- Published
- 2025-03-25
- DOI
- https://doi.org/10.1002/ange.202506105
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00