Bringing AR to volume manufacturing with optical lithography

Manufacturing AR waveguides with diffractive structures requires a high-volume, low-cost lithography solution that can print the necessary patterns with high accuracy and fidelity. Displacement Talbot Lithography (DTL) has emerged as one of the main contenders for this challenging task. DTL enables reproducible patterning of highly precise and defect-free gratings with large, seamless exposure fields and with the required resolution and quality. As an optical lithography technology, DTL relies on industry standard exposure concepts, materials, and resources such as photoresists, lasers, and photomasks. Adoption of this lithography technology to specific needs of the AR waveguide application and examples from its real-life implementation will be presented.