Resolving Dynamic Behavior of Electrocatalysts via Advances of Operando X‐Ray Absorption Spectroscopies: Potential Artifacts and Practical Guidelines
Although numerous techniques are developed to enable real-time understanding of dynamic interactions at the solid-liquid interface during electrochemical reactions, further progress in the development of these methods over the last several decades has faced challenges. With the rapid development of high-brilliance synchrotron sources, operando X-ray spectroscopies have become increasingly popular for revealing interfacial features and catalytic mechanisms in electrocatalysis. Nevertheless, the resulting spectra are highly sensitive to factors such as X-ray radiation, reaction environment, and acquisition procedures, all of which may potentially introduce artifacts that are often overlooked, leading to misinterpretations of electrocatalytic behaviors. In this perspective, several emerging hard X-ray spectroscopies used in electrocatalysis research are reviewed, highlighting their electronic transition processes, detection modes, and functional complementarity. Significantly, based on a case study of operando X-ray absorption spectroscopy at various beamlines, potential artifacts generated by X-ray irradiation are systematically investigated through photon-flux density-, dose-, and time-dependent studies of typical copper electrocatalysts. Accordingly, a practical protocol for conducting reliable X-ray spectroscopic measurements in operando electrocatalytic studies to minimize potential artifacts that can affect the resulting X-ray spectra, thereby ensuring accurate interpretation and a deeper understanding of interfacial interactions and electrocatalytic mechanisms, is established.
Authors
- Wei‐Tsung Chuang (ORCID: https://orcid.org/0000-0002-9000-2194)
- Nozomu Hiraoka (ORCID: https://orcid.org/0000-0002-9445-0066)
- Meng-Ting Liu
- Yu‐Cheng Shao (ORCID: https://orcid.org/0000-0002-6691-3799)
- Chih‐Wen Pao (ORCID: https://orcid.org/0000-0001-7681-4391)
- You‐Chiuan Chu
- Ching‐Yu Chiang (ORCID: https://orcid.org/0000-0002-3640-0474)
- Jeng‐Lung Chen (ORCID: https://orcid.org/0000-0002-0223-5538)
- Hirofumi Ishii (ORCID: https://orcid.org/0000-0001-8824-4090)
- Chia‐Shuo Hsu (ORCID: https://orcid.org/0000-0002-7767-8413)
- Yen‐Fa Liao (ORCID: https://orcid.org/0000-0001-7874-9941)
- Hao Ming Chen (ORCID: https://orcid.org/0000-0002-7480-9940)
- Jiali Wang (ORCID: https://orcid.org/0000-0001-5362-1546)
- Ting‐Shan Chan
Institutions
- National Taiwan University (TW)
- National Synchrotron Radiation Research Center (TW)
- Japan Synchrotron Radiation Research Institute (JP)
Publication Details
- Journal
- Advanced Materials
- Published
- 2025-03-24
- DOI
- https://doi.org/10.1002/adma.202418797
- Citations
- 9
- Primary Topic
- Electrochemical Analysis and Applications
- Type
- article
- Field-Weighted Citation Impact
- 4.64