Growth and characterization of a 2-inch (102) plane β-Ga <sub>2</sub> O <sub>3</sub> crystal <i>via</i> the edge-defined film-fed growth method

This study reports the first successful growth of a 2-inch (1̄02) plane β-Ga 2 O 3 crystal via the EFG method and provides a series of characterizations that highlight the (1̄02) plane as a promising substrate for vertical structure power devices.

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Publication Details

Journal
CrystEngComm
Published
2025-01-01
DOI
https://doi.org/10.1039/d4ce01282h
Citations
2
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.85
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article

Growth and characterization of a 2-inch (102) plane β-Ga 2 O 3 crystal via the edge-defined film-fed growth method

Zhucheng Li, Zhitai Jia, Wenxiang Mu, Xutang Tao et al.
2 citations
CrystEngComm
Ga2O3 and related materials
0.85
article

Growth and characterization of a 2-inch (102) plane β-Ga 2 O 3 crystal via the edge-defined film-fed growth method

Zhucheng Li, Zhitai Jia, Wenxiang Mu, Xutang Tao, B. X. Yu, Jin Zhang, Yiyuan Liu, Yue Dong, Boyang Chen
article en
2 citations

Abstract

This study reports the first successful growth of a 2-inch (1̄02) plane β-Ga 2 O 3 crystal via the EFG method and provides a series of characterizations that highlight the (1̄02) plane as a promising substrate for vertical structure power devices.

CrystEngCommVol. 27(17)
Shandong University (CN)
Openalex Percentile: Top 30%
Ga2O3 and related materials
0.85
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