Synergistic crucible design and thermal-flow management for enhanced 4-inch AlN single crystal PVT growth: a combined numerical and experimental investigation

By optimizing the thermal field position, crucible microstructure, and thermal flow field coupling, a 4-inch aluminum nitride single crystal with excellent growth uniformity was successfully fabricated.

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Publication Details

Journal
CrystEngComm
Published
2025-01-01
DOI
https://doi.org/10.1039/d5ce00214a
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
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article

Synergistic crucible design and thermal-flow management for enhanced 4-inch AlN single crystal PVT growth: a combined numerical and experimental investigation

Baikui Li, Honglei Wu, G. He, Yingmin Wang et al.
CrystEngComm
GaN-based semiconductor devices and materials
article

Synergistic crucible design and thermal-flow management for enhanced 4-inch AlN single crystal PVT growth: a combined numerical and experimental investigation

Baikui Li, Honglei Wu, G. He, Yingmin Wang, Zhenhua Sun, Qian Liu, Wenliang Li, Jun Tan
article en

Abstract

By optimizing the thermal field position, crucible microstructure, and thermal flow field coupling, a 4-inch aluminum nitride single crystal with excellent growth uniformity was successfully fabricated.

CrystEngCommVol. 27(20)
Shenzhen University (CN), China Electronics Technology Group Corporation (CN)
Openalex Percentile: Top 96%
GaN-based semiconductor devices and materials
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