Van der Waals Ferroelectric CuCrP<sub>2</sub>S<sub>6</sub>‐Enabled Hysteresis‐Free Negative Capacitance Field‐Effect Transistors

The relentless pursuit of miniaturization and reduced power consumption in information technology demands innovative device architectures. Negative capacitance field-effect transistors (NC-FETs) offer a promising solution by harnessing the negative capacitance effect of ferroelectric materials to amplify gate voltage and achieve steep subthreshold swings (SS). In this work, 2D van der Waals (vdW) ferroelectric CuCrP<sub>2</sub>S<sub>6</sub> (CCPS) is employed as the gate dielectric to realize hysteresis-free NC-FETs technology. Scanning microwave impedance microscopy (sMIM) is employed to investigate the dielectric property of CCPS, revealing a thickness-independent dielectric constant of ≈35. Subsequently, NC-FETs are fabricated with MoS<sub>2</sub> channel, and the capacitance matching conditions are meticulously investigated. The optimized devices exhibit simultaneously ultra-steep SS (≈12 mV dec<sup>-1</sup>) and negligible hysteresis, with immunity to both voltage scan range and scan rate. Finally, a resistor-loaded inverter is demonstrated manifesting a low operation voltage down to 0.2 V and hysteresis-free transfer characteristics. This work paves the way for the development of high-performance, low-power electronics by exploiting 2D vdW ferroelectric materials.

Authors

Institutions

Publication Details

Journal
Advanced Materials
Published
2025-03-23
DOI
https://doi.org/10.1002/adma.202419125
Citations
11
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
8.03

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Van der Waals Ferroelectric CuCrP2S6‐Enabled Hysteresis‐Free Negative Capacitance Field‐Effect Transistors

Han Chen, Yinfeng Long, Mengwei Si, Lin Wang et al.
11 citations
Advanced Materials
Ferroelectric and Negative Capacitance Devices
8.03
article

Van der Waals Ferroelectric CuCrP2S6‐Enabled Hysteresis‐Free Negative Capacitance Field‐Effect Transistors

Han Chen, Yinfeng Long, Mengwei Si, Lin Wang, Shiyu Zhang, Mingfeng Chen, Jinxiu Zhao, Kai Liu
article en
11 citations

Abstract

The relentless pursuit of miniaturization and reduced power consumption in information technology demands innovative device architectures. Negative capacitance field-effect transistors (NC-FETs) offer a promising solution by harnessing the negative capacitance effect of ferroelectric materials to amplify gate voltage and achieve steep subthreshold swings (SS). In this work, 2D van der Waals (vdW) ferroelectric CuCrP<sub>2</sub>S<sub>6</sub> (CCPS) is employed as the gate dielectric to realize hysteresis-free NC-FETs technology. Scanning microwave impedance microscopy (sMIM) is employed to investigate the dielectric property of CCPS, revealing a thickness-independent dielectric constant of ≈35. Subsequently, NC-FETs are fabricated with MoS<sub>2</sub> channel, and the capacitance matching conditions are meticulously investigated. The optimized devices exhibit simultaneously ultra-steep SS (≈12 mV dec<sup>-1</sup>) and negligible hysteresis, with immunity to both voltage scan range and scan rate. Finally, a resistor-loaded inverter is demonstrated manifesting a low operation voltage down to 0.2 V and hysteresis-free transfer characteristics. This work paves the way for the development of high-performance, low-power electronics by exploiting 2D vdW ferroelectric materials.

Advanced MaterialsVol. 37(18)
Shanghai Jiao Tong University (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 2%
Ferroelectric and Negative Capacitance Devices
8.03
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.