Transfer of Substitutionally Implanted Graphene

Although ultralow energy (ULE) ion implantation is an effective method for substitutional doping of graphene with transition metals, it generally results in substantial nonsubstitutional incorporation, such as atoms intercalated between the graphene layer and the substrate or incorporated in the substrate subsurface. These nonsubstitutional components can have undesired or uncontrolled effects on the electronic properties of the doped graphene layer. Here, we demonstrate that graphene, substitutionally doped with Mn via ULE ion implantation, can be successfully transferred using a standard wet transfer process. This method preserves the substitutional Mn while removing the nonsubstitutional Mn present in the pretransfer surface, as evidenced by X-ray photoelectron spectroscopy, X-ray absorption spectroscopy, and scanning tunneling microscopy. Furthermore, the transferred Mn-doped graphene retains its characteristic Dirac band structure, as shown by angle-resolved photoemission spectroscopy. These results demonstrate the feasibility of transferring substitutionally doped graphene while maintaining its structural and electronic integrity. This work provides a practical route not only for studying graphene doped by ULE ion implantation using surface-sensitive techniques, free from the complications posed by nonsubstitutional components, but also for integrating it into complex structures, such as stacking with other 2D materials or transferring onto virtually any substrate or device structure.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2025-03-24
DOI
https://doi.org/10.1021/acsami.4c18342
Citations
1
Primary Topic
Graphene research and applications
Type
article
Field-Weighted Citation Impact
0.52

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Transfer of Substitutionally Implanted Graphene

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article en
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Abstract

Although ultralow energy (ULE) ion implantation is an effective method for substitutional doping of graphene with transition metals, it generally results in substantial nonsubstitutional incorporation, such as atoms intercalated between the graphene layer and the substrate or incorporated in the substrate subsurface. These nonsubstitutional components can have undesired or uncontrolled effects on the electronic properties of the doped graphene layer. Here, we demonstrate that graphene, substitutionally doped with Mn via ULE ion implantation, can be successfully transferred using a standard wet transfer process. This method preserves the substitutional Mn while removing the nonsubstitutional Mn present in the pretransfer surface, as evidenced by X-ray photoelectron spectroscopy, X-ray absorption spectroscopy, and scanning tunneling microscopy. Furthermore, the transferred Mn-doped graphene retains its characteristic Dirac band structure, as shown by angle-resolved photoemission spectroscopy. These results demonstrate the feasibility of transferring substitutionally doped graphene while maintaining its structural and electronic integrity. This work provides a practical route not only for studying graphene doped by ULE ion implantation using surface-sensitive techniques, free from the complications posed by nonsubstitutional components, but also for integrating it into complex structures, such as stacking with other 2D materials or transferring onto virtually any substrate or device structure.

ACS Applied Materials & InterfacesVol. 17(13)
Laboratoire de physique des Solides (FR), Synchrotron soleil (FR), Elettra-Sincrotrone Trieste S.C.p.A. (IT), Interuniversity Center for Educational Research (NL), IMEC (BE), FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic (CZ), Photon Imaging (United States) (US), University of Göttingen (DE), KU Leuven (BE)
Fonds Wetenschappelijk Onderzoek, KU Leuven, H2020 Research Infrastructures
Zero hunger
Openalex Percentile: Top 41%
Graphene research and applications
0.52
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