Morphology and Wettability of Hexagonal BCxNy Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamine Borane

Hexagonal boron carbonitride films are obtained by plasma-enhanced chemical vapor deposition using a mixture of trimethylamine borane ((Me)3N·BH3) vapor and nitrogen in the temperature range 100‒700°C. The influence of the synthesis temperature, generator frequency, and plasma power on the chemical composition, structure, and morphology of the films is studied. The films obtained at temperatures of 200–700 and 300–700°C and generator frequencies of 27.12 and 13.56 MHz, respectively, are formed by nanowalls. Up to 600°C, the nanowalls have a maze-like morphology. The length of the nanowalls and the distance between them can be adjusted by changing the synthesis conditions. Above 600°C, nanowalls with a wavy morphology are formed. The contact angle of the water wetting of 200-nm-thick films varied within 0°‒62°.