An Improved Crystal Cell Offset Modeling and Atom Coding Approach for Monte Carlo Simulation of Quartz Wet Etching

Wet etching of quartz is an important microfabrication technique for etching and patterning structures by etching material surfaces using liquid chemicals. However, because of its complex anisotropy, the simulation of the etching results is often difficult to predict and control. In this paper, we propose a new modeling method based on Monte Carlo method by calculating the offsets between the cells of quartz atoms, and a new atomic coding method that can quickly determine the characteristic properties around each atom and distinguish between bonds with the same bond lengths but different types. Compared with the traditional modeling method, the algorithm reduces the amount of computation and computation time by avoiding a large number of computational processes during modeling and the need to traverse all other atoms to determine the configuration state of the target atom after the modeling is completed. The subsequent simulation results are basically consistent with the experimental graphical comparisons, providing a new modeling method and atom encoding approach for the simulation modeling of etched structure and morphology prediction of other cut types.