Tailorable Diamond Cavities: A Novel Approach to Self-Standing Diamond Film Fabrication

This study presents a novel approach for fabricating self-standing diamond films with tailorable cavities, eliminating the need for reactive ion etching (RIE).We employed selective area deposition on SiO2/Si substrates in a microwave plasma CVD system at high temperatures (1000C).The method exploits the thermal expansion mismatch between diamond and SiO/Si substrates to induce film delamination, resulting in free-standing structures.Diamond films with thicknesses of approximately 50 m were produced, featuring cavities whose dimensions could be controlled by lithography mask dimensions and deposition time.Raman spectroscopy confirmed the high quality of the diamond films, showing a dominant peak centered at 1330 cm - 1 .The presented technological approach offers a promising solution for microstructuring of diamond films with potential applications in high-tech applications.