High throughput two-photon-lithography system powered by metalens array
Two-Photon-Lithography (TPL) is a powerful nano-3D printing technique known for leveraging non-linear absorption to enable sub-micron printing resolution. However, the throughput of TPL is limited owing to its single laser spot scanning mechanism and the limited field-of-view of conventional microscope objectives. We present a novel parallelized TPL platform that replaces the single high-NA objective with a large array of high-NA, polymer immersion metalenses. Independent control over the focusing intensity from each metalens is achieved using a Spatial Light Modulator (SLM) to modulate the intensity of each metalens focusing spot, enabling the large scale writing of periodic and aperiodic patterns with time scales and stitching errors that exceed the capabilities of conventional platforms.
Authors
- Chenkai Mao (ORCID: https://orcid.org/0009-0004-6602-1952)
- Travis L. Massey (ORCID: https://orcid.org/0000-0003-4842-3267)
- Anna Güell Izard (ORCID: https://orcid.org/0000-0002-4416-7609)
- Xiaoxing Xia (ORCID: https://orcid.org/0000-0003-1255-3289)
- Wenjie Zhou (ORCID: https://orcid.org/0000-0002-7626-4032)
- Songyun Gu (ORCID: https://orcid.org/0000-0002-9847-6685)
- Jonathan A. Fan (ORCID: https://orcid.org/0000-0001-9816-9979)
- Alex Abelson (ORCID: https://orcid.org/0000-0002-5887-5278)
- Won Jin Choi (ORCID: https://orcid.org/0000-0001-6303-8899)
- Chiara Daraio
- You Zhou (ORCID: https://orcid.org/0000-0001-5999-5696)
- Thej Tumkur Umanath
- Liliana Dongping Terrel-Perez
- Magi Yassa
- Sarvesh A. Sadana (ORCID: https://orcid.org/0009-0001-0135-9651)
Institutions
- Lawrence Livermore National Laboratory (US)
Publication Details
- Published
- 2025-03-19
- DOI
- https://doi.org/10.1117/12.3044163
- Citations
- 3
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 2.02