Improving diacetylene photopolymerization in monolayers and ultrathin films
Gentle annealing and photopolymerization under inert atmospheres strongly enhance the quality of polydiacetylene monolayers. These simple measures not only triple the average degree of polymerization but also alter the preferred photoexcitation mode and cause pronounced nano-alignment during the early stages of polymerization.
Authors
- Kunal S. Mali (ORCID: https://orcid.org/0000-0002-9938-6446)
- Louis A. Cuccia (ORCID: https://orcid.org/0000-0001-7999-2249)
- Hongzhen Lin (ORCID: https://orcid.org/0000-0001-8764-1246)
- Oleksandr Ivasenko (ORCID: https://orcid.org/0000-0001-9182-3974)
- Lifeng Chi (ORCID: https://orcid.org/0000-0003-3835-2776)
- Steven De Feyter (ORCID: https://orcid.org/0000-0002-0909-9292)
- Sven Bernaerts (ORCID: https://orcid.org/0000-0002-9739-4952)
- Jie Ji (ORCID: https://orcid.org/0000-0002-0280-5801)
- Rui Ding (ORCID: https://orcid.org/0000-0003-2880-9736)
- Li Yao (ORCID: https://orcid.org/0000-0002-7226-7551)
- Yuan Fang (ORCID: https://orcid.org/0000-0002-2064-1038)
Institutions
- Chinese Academy of Sciences (CN)
- Soochow University (CN)
- Suzhou Institute of Nano-tech and Nano-bionics (CN)
- Concordia University (CA)
- KU Leuven (BE)
Publication Details
- Journal
- Nanoscale
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5nr00520e
- Citations
- 1
- Primary Topic
- Polydiacetylene-based materials and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.94