Molecular beam epitaxy of AlGaN nanowires: source configuration and correlated material properties and device characteristics

Advancement on the molecular beam epitaxy of AlGaN nanowires is discussed with a focus on the effect of system layout, through which it aims to spark new thinking on how the system layout – a less discussed topic – affects the material properties.

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Publication Details

Journal
CrystEngComm
Published
2025-01-01
DOI
https://doi.org/10.1039/d5ce00147a
Citations
2
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
2.52

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article

Molecular beam epitaxy of AlGaN nanowires: source configuration and correlated material properties and device characteristics

Songrui Zhao
2 citations
CrystEngComm
GaN-based semiconductor devices and materials
2.52
article

Molecular beam epitaxy of AlGaN nanowires: source configuration and correlated material properties and device characteristics

Songrui Zhao
article en
2 citations

Abstract

Advancement on the molecular beam epitaxy of AlGaN nanowires is discussed with a focus on the effect of system layout, through which it aims to spark new thinking on how the system layout – a less discussed topic – affects the material properties.

CrystEngCommVol. 27(18)
McGill University (CA)
McGill University, Natural Sciences and Engineering Research Council of Canada
Openalex Percentile: Top 13%
GaN-based semiconductor devices and materials
2.52
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Molecular beam epitaxy of AlGaN nanowires: source configuration and correlated material properties and device characteristics — Songrui Zhao · CrystEngComm (2025) | TGRS Research Map | TGRS