Ultrahigh finesse buckled micro-mirrors for visible/telecom applications
A novel method is used to fabricate state-of-the-art micro-mirrors at wafer scales, with the Radius of Curvature (ROC) in the range of 90 um ~ above 700 μm, and a finesse of over 3.3 x10<sup>5</sup> at 780 nm. They form robust microcavities suitable for laser stabilization and for studying neutral atom cavity Quantum Electrodynamics (QED).
Authors
- Ki Youl Yang (ORCID: https://orcid.org/0000-0002-0587-3201)
- Marko Lončar (ORCID: https://orcid.org/0000-0002-5029-5017)
- Sophie Weiyi Ding (ORCID: https://orcid.org/0000-0002-5476-6832)
- Mikhail D. Lukin (ORCID: https://orcid.org/0000-0002-8658-1007)
- Brandon Grinkemeyer (ORCID: https://orcid.org/0000-0002-6337-9447)
- Eirini Mandopoulou
- Rui Jiang (ORCID: https://orcid.org/0009-0005-9856-4609)
Institutions
- Harvard University Press (US)
Publication Details
- Published
- 2025-03-19
- DOI
- https://doi.org/10.1117/12.3042417
- Primary Topic
- Optical Coatings and Gratings
- Type
- article
- Field-Weighted Citation Impact
- 0.00