Femtosecond GHz fs pulses: how to increase the productivity of industrial applications

We report on femtosecond pulses with GHz bursts processing strategies to significantly improve the ablation efficiency of femtosecond lasers, especially for metals and silicon. Line scribing with GHz burst regime of femtosecond pulses are performed at 1030 and 515 nm. The number of pulses per bursts varied from 50 ppb to 2000 ppb. A second harmonic generation module was placed at the output of a 100 W femtosecond GHz laser to generate up to 50W of second harmonic (SHG,515nm) at 200 kHz. The results show the highest ablation efficiency obtained on silicon with fs pulses (more than 10 mm3/min/W), and the crucial role of the pulse overlap. Femtosecond technologies hold significant promise in the automotive sector, opening a wide array of compelling possibilities. We will examine several cases, including the cutting and texturing of battery electrodes.