Thermally Stable InGaSnO Thin-Film Transistors Using Crystalline Oxide Semiconductor

In this work, we developed a high-performance, coplanar crystalline InGaSnO (C-IGTO) thin-film transistor (TFT). An amorphous indium gallium tin oxide (IGTO) film was deposited with reactive sputtering with H2 introduction, followed by an O2 post-deposition crystallization at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$500~^{\circ }$ </tex-math></inline-formula>C, resulting in a highly oriented crystal with smooth surface. The transfer characteristics of the C-IGTO TFT exhibit negligible temperature dependency up to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$150~^{\circ }$ </tex-math></inline-formula>C and endure up to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$400~^{\circ }$ </tex-math></inline-formula>C post-fabrication annealing in air. The gate shift register (GSR) and ring oscillator (RO) circuits made of C-IGTO TFTs exhibit outstanding performance. A 24-stage, GSR operates effectively with the TFTs of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.3~\mu $ </tex-math></inline-formula>m channel length. These circuits maintain excellent operational stability without degradation at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$100~^{\circ }$ </tex-math></inline-formula>C. In addition, The RO exhibits a low propagation delay of 2.14 ns. To evaluate the applicability for high-density memory devices, we fabricated a capacitorless, two-transistor (2T0C) dynamic random access memory (DRAM) cell. This shows a long retention time over 2000 s with extremely low <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-current (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4.5\times 10^{-{20}}$ </tex-math></inline-formula> A/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu $ </tex-math></inline-formula>m). The successful demonstrations of DRAM cell and integrated circuits using the C-IGTO TFTs highlight the potential for integration of memory and TFT circuits for next-generation memory and IT applications.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2025-03-18
DOI
https://doi.org/10.1109/ted.2025.3546600
Citations
2
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
1.46
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article

Thermally Stable InGaSnO Thin-Film Transistors Using Crystalline Oxide Semiconductor

Yurim Kim, Jinbaek Bae, Junyeong Kim, Jin Jang et al.
2 citations
IEEE Transactions on Electron Devices
Thin-Film Transistor Technologies
1.46
article

Thermally Stable InGaSnO Thin-Film Transistors Using Crystalline Oxide Semiconductor

Yurim Kim, Jinbaek Bae, Junyeong Kim, Jin Jang, Jiwon Sun, Seungmin Woo, Solbee Lee, Sunaina Priyadarshi, Taebin Lim, Byeonggwan Kim, Seungho Lee, Tae‐Won Kim, Bongjin Kuh, Jihyun Koh
article en
2 citations

Abstract

In this work, we developed a high-performance, coplanar crystalline InGaSnO (C-IGTO) thin-film transistor (TFT). An amorphous indium gallium tin oxide (IGTO) film was deposited with reactive sputtering with H2 introduction, followed by an O2 post-deposition crystallization at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$500~^{\circ }$ </tex-math></inline-formula>C, resulting in a highly oriented crystal with smooth surface. The transfer characteristics of the C-IGTO TFT exhibit negligible temperature dependency up to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$150~^{\circ }$ </tex-math></inline-formula>C and endure up to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$400~^{\circ }$ </tex-math></inline-formula>C post-fabrication annealing in air. The gate shift register (GSR) and ring oscillator (RO) circuits made of C-IGTO TFTs exhibit outstanding performance. A 24-stage, GSR operates effectively with the TFTs of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.3~\mu $ </tex-math></inline-formula>m channel length. These circuits maintain excellent operational stability without degradation at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$100~^{\circ }$ </tex-math></inline-formula>C. In addition, The RO exhibits a low propagation delay of 2.14 ns. To evaluate the applicability for high-density memory devices, we fabricated a capacitorless, two-transistor (2T0C) dynamic random access memory (DRAM) cell. This shows a long retention time over 2000 s with extremely low <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-current (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4.5\times 10^{-{20}}$ </tex-math></inline-formula> A/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu $ </tex-math></inline-formula>m). The successful demonstrations of DRAM cell and integrated circuits using the C-IGTO TFTs highlight the potential for integration of memory and TFT circuits for next-generation memory and IT applications.

IEEE Transactions on Electron DevicesVol. 72(5)
Samsung (South Korea) (KR), Kyung Hee University (KR)
Affordable and clean energy
Openalex Percentile: Top 19%
Thin-Film Transistor Technologies
1.46
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