Measurement of Discharge and Plasma Parameters in a Vacuum (Gasless) Magnetron Sputtering System
We presented results of an experimental study of a continuous magnetron discharge in vacuum (gasless) mode with a flat target. The base pressure in the vacuum chamber during the discharge operation was 3 × 10–5 Torr at a magnetron current of 10 A. We developed techniques for measuring the mass-to-charge composition of plasma ions and the electron temperature under conditions of intense target sputtering. Measurement of target temperature was carried out. We developed techniques for comparison of ion current density and degree of ionization of the target material near the substrate in gas and vacuum modes.
Authors
- K. P. Savkin (ORCID: https://orcid.org/0000-0001-6984-8550)
- А. С. Бугаев (ORCID: https://orcid.org/0000-0002-7406-6235)
- M. V. Shandrikov (ORCID: https://orcid.org/0000-0002-0844-0356)
- M.I. Azhgikhin (ORCID: https://orcid.org/0000-0002-1558-1026)
- P. V. Moskvin (ORCID: https://orcid.org/0000-0002-5240-9970)
- G. Yu. Yushkov (ORCID: https://orcid.org/0000-0002-7615-6058)
- Ефим Михайлович Окс (ORCID: https://orcid.org/0000-0002-9323-0686)
- A. A. Cherkasov (ORCID: https://orcid.org/0000-0002-2429-4969)
- K. A. Shcheglov
Institutions
- Institute of High Current Electronics (RU)
Publication Details
- Journal
- Bulletin of the Russian Academy of Sciences Physics
- Published
- 2024-12-01
- DOI
- https://doi.org/10.1134/s1062873824710638
- Citations
- 2
- Primary Topic
- Metal and Thin Film Mechanics
- Type
- article
- Field-Weighted Citation Impact
- 0.54