Cover Feature: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two‐Dimensional Perovskite Nanosheets: An AFM Study (ChemPlusChem 3/2025)

The cover feature shows AFM detection of exfoliation agent residue removal on perovskite nanosheet-based nanofilms after UV exposure. AFM measurements, performed using a silicon probe, reveal how surface properties evolve with UV exposure duration, influencing nanosheet homogeneity and adhesion. The findings highlight the need to optimize UV exposure duration for effective residue removal while preserving surface quality. More details can be found in the Research Article by Fatma Pinar Gordesli-Duatepe, Özge Sağlam, and Begümnur Küçükcan (DOI: 10.1002/cplu.202400678).