Study of Chemical Resistance of Epoxy Binders in Various Media

Studies have been conducted on the chemical resistance of various binders based on ED-20 resin and IMTGFA, KhT-152 B, and Etal-45M hardeners, as well as a binder based on modified Etal-370 epoxy resin and Etal-450 hardener. The composition based on ED-20 and KhT-152 B showed high chemical resistance in such media as water, 10% NaOH solution, concentrated hydrochloric acid, and 3.5% sea salt solution. The binder based on Etal-370 and Etal-450 has better chemical resistance to concentrated sulfuric acid. All the binder compositions studied in this work have high chemical resistance to concentrated hydrochloric acid.

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Publication Details

Journal
Polymer Science Series D
Published
2024-12-01
DOI
https://doi.org/10.1134/s1995421224701363
Citations
1
Primary Topic
Epoxy Resin Curing Processes
Type
article
Field-Weighted Citation Impact
0.21
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article

Study of Chemical Resistance of Epoxy Binders in Various Media

А. N. Blaznov, Z. G. Sakoshev, G. S. Zadvornykh, E. G. Sakoshev
1 citations
Polymer Science Series D
Epoxy Resin Curing Processes
0.21
article

Study of Chemical Resistance of Epoxy Binders in Various Media

А. N. Blaznov, Z. G. Sakoshev, G. S. Zadvornykh, E. G. Sakoshev
article en
1 citations

Abstract

Studies have been conducted on the chemical resistance of various binders based on ED-20 resin and IMTGFA, KhT-152 B, and Etal-45M hardeners, as well as a binder based on modified Etal-370 epoxy resin and Etal-450 hardener. The composition based on ED-20 and KhT-152 B showed high chemical resistance in such media as water, 10% NaOH solution, concentrated hydrochloric acid, and 3.5% sea salt solution. The binder based on Etal-370 and Etal-450 has better chemical resistance to concentrated sulfuric acid. All the binder compositions studied in this work have high chemical resistance to concentrated hydrochloric acid.

Polymer Science Series DVol. 17(4)
Siberian Branch of the Russian Academy of Sciences (RU)
Openalex Percentile: Top 48%
Epoxy Resin Curing Processes
0.21
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