High-aspect-ratio photoresist nanopillar arrays with broadband near-perfect optical absorption performance using PDMS-assisted colloidal lithography
By PDMS-assisted colloidal lithography, high-aspect-ratio microstructures were employed as the structure for the successful fabrication of broadband near-perfect optical absorbers.
Authors
- Guochen Li (ORCID: https://orcid.org/0000-0002-0743-8692)
- Ming Fu (ORCID: https://orcid.org/0000-0002-8539-375X)
- Zheli Wu
- Jiefeng Li
- Peixin Chu
- Xiaoyu Liu (ORCID: https://orcid.org/0000-0002-0763-0182)
- Yongsheng Wang (ORCID: https://orcid.org/0000-0002-1290-4299)
- Chenhui Wei (ORCID: https://orcid.org/0000-0002-3337-3060)
- Yuting Zhang (ORCID: https://orcid.org/0000-0001-8784-2937)
- Zhengjie Guo
- Dawei He (ORCID: https://orcid.org/0000-0001-6786-4661)
- Yuanhao Liu (ORCID: https://orcid.org/0009-0000-7562-588X)
Institutions
- Beijing Jiaotong University (CN)
Publication Details
- Journal
- Journal of Materials Chemistry C
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5tc00296f
- Primary Topic
- Photonic Crystals and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China