Dynamic Performance Analysis of p-GaN HEMTs With Floating Substrates by Substrate Capacitance Coupling Model

A comprehensive and in-depth evaluation of the dynamic characteristics of p-GaN high-electron-mobility transistor (HEMT) components featuring a floating substrate is carried out, contrasting with devices having a source-connected substrate in traditional applications. A thorough analysis reveals similar degradation patterns of both devices but varying degrees of dynamic performance deterioration under transient stress. Experimental results show that under 200-V <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS,off}}$ </tex-math></inline-formula> stress, devices with floating substrates experience a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {TH}}$ </tex-math></inline-formula> shift of 2.6 V and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on}}$ </tex-math></inline-formula> degradation of 30%, while those with source-connected substrates exhibit a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {TH}}$ </tex-math></inline-formula> shift of 1.15 V and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on}}$ </tex-math></inline-formula> degradation of 7%. A proposed capacitance coupling model specific to floating substrates explains the suboptimal dynamic performance. The negative substrate voltage, induced by capacitor charge imbalances during <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-state stress, is a key factor affecting device performance. Understanding the sequence of hole and electron capture, along with dynamic resistance variations, is crucial for maximizing the advantages of p-GaN HEMTs with floating substrates.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2025-03-14
DOI
https://doi.org/10.1109/ted.2025.3547700
Citations
4
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
5.03

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article

Dynamic Performance Analysis of p-GaN HEMTs With Floating Substrates by Substrate Capacitance Coupling Model

Yufei Tian, Xuetong Zhou, Wenyao Feng, Xinhong Cheng et al.
4 citations
IEEE Transactions on Electron Devices
GaN-based semiconductor devices and materials
5.03
article

Dynamic Performance Analysis of p-GaN HEMTs With Floating Substrates by Substrate Capacitance Coupling Model

Yufei Tian, Xuetong Zhou, Wenyao Feng, Xinhong Cheng, Li Zheng, Lingyan Shen, Hang Su, Yalei Hu
article en
4 citations

Abstract

A comprehensive and in-depth evaluation of the dynamic characteristics of p-GaN high-electron-mobility transistor (HEMT) components featuring a floating substrate is carried out, contrasting with devices having a source-connected substrate in traditional applications. A thorough analysis reveals similar degradation patterns of both devices but varying degrees of dynamic performance deterioration under transient stress. Experimental results show that under 200-V <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS,off}}$ </tex-math></inline-formula> stress, devices with floating substrates experience a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {TH}}$ </tex-math></inline-formula> shift of 2.6 V and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on}}$ </tex-math></inline-formula> degradation of 30%, while those with source-connected substrates exhibit a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {TH}}$ </tex-math></inline-formula> shift of 1.15 V and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on}}$ </tex-math></inline-formula> degradation of 7%. A proposed capacitance coupling model specific to floating substrates explains the suboptimal dynamic performance. The negative substrate voltage, induced by capacitor charge imbalances during <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">off</small>-state stress, is a key factor affecting device performance. Understanding the sequence of hole and electron capture, along with dynamic resistance variations, is crucial for maximizing the advantages of p-GaN HEMTs with floating substrates.

IEEE Transactions on Electron DevicesVol. 72(5)
Chinese Academy of Sciences (CN), Shanghai Institute of Microsystem and Information Technology (CN)
Science and Technology Commission of Shanghai Municipality, Youth Innovation Promotion Association of the Chinese Academy of Sciences, National Key Research and Development Program of China
Openalex Percentile: Top 6%
GaN-based semiconductor devices and materials
5.03
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