Patch probe for plasma resonance spectroscopy to measure electron density of edge plasma contacted chamber surfaces in a low-pressure plasmas

Abstract We propose a flexible and thin patch-type plasma resonance spectroscopy probe enough to be attached to different chamber surfaces. The patch probe, composed of thin metal and dielectric layers, can measure the plasma electron density near any surface in contact with plasma in the chamber. We confirmed that the patch probe can obtain a distribution of the electron density on different chamber surfaces where the probe is attached, namely the chuck, chamber wall, and bottom. From the results, we found variations in electron density depending on the location in the chamber under different RF power and pressure.

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Publication Details

Journal
Japanese Journal of Applied Physics
Published
2025-03-01
DOI
https://doi.org/10.35848/1347-4065/adc051
Primary Topic
Laser-induced spectroscopy and plasma
Type
article
Field-Weighted Citation Impact
0.00

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article

Patch probe for plasma resonance spectroscopy to measure electron density of edge plasma contacted chamber surfaces in a low-pressure plasmas

GeonWoong Eom, S. J. You, Sijun Kim, InYong Park et al.
Japanese Journal of Applied Physics
Laser-induced spectroscopy and plasma
article

Patch probe for plasma resonance spectroscopy to measure electron density of edge plasma contacted chamber surfaces in a low-pressure plasmas

GeonWoong Eom, S. J. You, Sijun Kim, InYong Park, Byonghoon Seo, Jin Young Lee, Daewoong Kim, Min Hur, Woo Seok Kang, Sang-Ho Lee
article en

Abstract

Abstract We propose a flexible and thin patch-type plasma resonance spectroscopy probe enough to be attached to different chamber surfaces. The patch probe, composed of thin metal and dielectric layers, can measure the plasma electron density near any surface in contact with plasma in the chamber. We confirmed that the patch probe can obtain a distribution of the electron density on different chamber surfaces where the probe is attached, namely the chuck, chamber wall, and bottom. From the results, we found variations in electron density depending on the location in the chamber under different RF power and pressure.

Japanese Journal of Applied PhysicsVol. 64(3)
Chungnam National University (KR), Korea Institute of Machinery & Materials (KR), Embry–Riddle Aeronautical University (US)
U.S. Department of Energy
Openalex Percentile: Top 95%
Laser-induced spectroscopy and plasma
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