Optimization of the drain-side configuration in ESD-protection SCR-LDMOS for high holding-voltage applications
A conventional silicon-controlled rectifier integrated into a laterally diffused MOSFET (SCR-LDMOS) is studied through 2D TCAD simulations in order to obtain the maximum holding voltage without increasing the area consumption or degrading the power-to-failure robustness. A reference device with 150V trigger voltage, 3V holding voltage and an approximate thermal breakdown at 30 mA/ μ m is adopted. Different configurations of the drain-side region are compared, with the best solution showing a 5x improvement on the holding condition without a significant variation on the other figures of merit. • Tunable holding voltage is a key element for future self-protecting ESD cells. • 2D TCAD simulations are used to address the role of the NBL isolation on the holding regime and thermal runaway. • SCR-LDMOS for high holding voltage are investigated providing the relevant physical understanding. • A preliminary analysis of the very-fast TLP characteristic and of the dynamic voltage overshoot under very fast rising time are presented.
Authors
- Rajkumar Sankaralingam
- Susanna Reggiani (ORCID: https://orcid.org/0000-0002-9616-8558)
- Laura Zunarelli
- Gianluca Boselli (ORCID: https://orcid.org/0000-0003-0665-4630)
- Elena Gnani (ORCID: https://orcid.org/0000-0001-6949-5919)
- Mariano Dissegna
- S. Rotorato
Institutions
- Texas Instruments (United States) (US)
- University of Bologna (IT)
Publication Details
- Journal
- Microelectronics Reliability
- Published
- 2025-03-13
- DOI
- https://doi.org/10.1016/j.microrel.2025.115664
- Citations
- 6
- Primary Topic
- Electrostatic Discharge in Electronics
- Type
- article
- Field-Weighted Citation Impact
- 4.38