Formation of Micrometer‐Sized Textured Hexagonal Silicon Crystals via Nanoindentation

A comprehensive study on the formation of micrometer‐sized, textured hexagonal diamond silicon (hd‐Si) crystals via nanoindentation followed by annealing is presented. Utilizing advanced characterization techniques such as polarized Raman spectroscopy, high‐resolution transmission electron microscopy, and electron energy‐loss spectroscopy, the successful transformation of silicon into high‐quality hd‐Si is demonstrated. The experimental results are further supported by first‐principles calculations and molecular dynamics simulations. Notably, the hd‐Si phase consists of nanometer‐sized grains with slight misorientations, organized into large micrometer‐scale textured domains. These findings underscore the potential of nanoindentation as a precise and versatile tool for inducing pressure‐driven phase transformations, particularly for the stabilization of hexagonal silicon. The textured nature of hd‐Si also presents a unique opportunity to tailor its optical properties, opening new avenues for its application in semiconductor and optoelectronic devices.

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Publication Details

Journal
Small Structures
Published
2025-03-02
DOI
https://doi.org/10.1002/sstr.202400552
Citations
3
Primary Topic
Silicon Nanostructures and Photoluminescence
Type
article
Field-Weighted Citation Impact
1.55
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Formation of Micrometer‐Sized Textured Hexagonal Silicon Crystals via Nanoindentation

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Formation of Micrometer‐Sized Textured Hexagonal Silicon Crystals via Nanoindentation

Davide Spirito, Agnieszka Anna Corley‐Wiciak, Gerald J.K. Schaffar, Leo Miglio, Emilio Scalise, M. Bikerouin, Antonio Massimiliano Mio, Anna Marzegalli, Fabrizio Rovaris, Mohamed Zaghloul, Corrado Bongiorno, Verena Maier‐Kiener, Giovanni Capellini
article en
3 citations

Abstract

A comprehensive study on the formation of micrometer‐sized, textured hexagonal diamond silicon (hd‐Si) crystals via nanoindentation followed by annealing is presented. Utilizing advanced characterization techniques such as polarized Raman spectroscopy, high‐resolution transmission electron microscopy, and electron energy‐loss spectroscopy, the successful transformation of silicon into high‐quality hd‐Si is demonstrated. The experimental results are further supported by first‐principles calculations and molecular dynamics simulations. Notably, the hd‐Si phase consists of nanometer‐sized grains with slight misorientations, organized into large micrometer‐scale textured domains. These findings underscore the potential of nanoindentation as a precise and versatile tool for inducing pressure‐driven phase transformations, particularly for the stabilization of hexagonal silicon. The textured nature of hd‐Si also presents a unique opportunity to tailor its optical properties, opening new avenues for its application in semiconductor and optoelectronic devices.

Small StructuresVol. 6(6)
Roma Tre University (IT), Montanuniversität Leoben (AT), Basque Center for Materials, Applications and Nanostructures (ES), Institute for Microelectronics and Microsystems (IT), University of Milano-Bicocca (IT), Leibniz Institute for High Performance Microelectronics (DE)
Openalex Percentile: Top 19%
Silicon Nanostructures and Photoluminescence
1.55
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