Improvement of light extraction and carrier injection in far UV-C LEDs on AlN substrate via conductive p-Al<sub>0.45</sub>Ga<sub>0.55</sub>N contact layer

Abstract In this study, we report the application of a p-Al 0.45 Ga 0.55 N contact layer in far ultraviolet-C light-emitting diodes (LEDs) on AlN substrates to enhance wall-plug efficiency (WPE). The LEDs achieved an optical power of 9.3 mW and a voltage of 6.4 V at 100 mA current, corresponding to a 1.7-fold improvement in WPE (1.4%) compared to conventional p-GaN-based LEDs. Lifetime tests suggest that this efficiency gain arises from both light extraction and carrier injection. Finally, Hall-effect measurements of bulk Mg-doped Al 0.45 Ga 0.55 N demonstrated low resistivity, small activation energy, and inverted carrier type.

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Publication Details

Journal
Applied Physics Express
Published
2025-03-01
DOI
https://doi.org/10.35848/1882-0786/adbfda
Citations
6
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
7.55
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article

Improvement of light extraction and carrier injection in far UV-C LEDs on AlN substrate via conductive p-Al0.45Ga0.55N contact layer

TaeGi Lee, Hirotsugu Kobayashi, Yusuke Okuaki, Mitsuhiro Nakayama
6 citations
Applied Physics Express
GaN-based semiconductor devices and materials
7.55
article

Improvement of light extraction and carrier injection in far UV-C LEDs on AlN substrate via conductive p-Al0.45Ga0.55N contact layer

TaeGi Lee, Hirotsugu Kobayashi, Yusuke Okuaki, Mitsuhiro Nakayama
article en
6 citations

Abstract

Abstract In this study, we report the application of a p-Al 0.45 Ga 0.55 N contact layer in far ultraviolet-C light-emitting diodes (LEDs) on AlN substrates to enhance wall-plug efficiency (WPE). The LEDs achieved an optical power of 9.3 mW and a voltage of 6.4 V at 100 mA current, corresponding to a 1.7-fold improvement in WPE (1.4%) compared to conventional p-GaN-based LEDs. Lifetime tests suggest that this efficiency gain arises from both light extraction and carrier injection. Finally, Hall-effect measurements of bulk Mg-doped Al 0.45 Ga 0.55 N demonstrated low resistivity, small activation energy, and inverted carrier type.

Applied Physics ExpressVol. 18(3)
Asahi Kasei (Japan) (JP)
Openalex Percentile: Top 3%
GaN-based semiconductor devices and materials
7.55
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