Coating of Self‐Sensing Atomic Force Microscopy Cantilevers with Boron‐Doped Nanocrystalline Diamond at Low Temperatures

The article “Coating of Self-Sensing Atomic Force Microscopy Cantilevers with Boron-Doped Nanocrystalline Diamond at Low Temperatures” by Štěpán Potocký et al. (2400553) explores parameters of a low-temperature microwave plasma process with a smart use of microscopic temperature gradient for localized conductive diamond coating of self-sensing atomic force microscopy cantilever probes with an integrated sensing circuit. Sensitive and durable electrical current mapping by atomic force microscopy is demonstrated on micropatterned metal layers and silicon nanodevices in air and under vacuum, a highly demanded feature in the semiconductor industry.

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Publication Details

Journal
physica status solidi (a)
Published
2025-03-01
DOI
https://doi.org/10.1002/pssa.202570009
Citations
1
Primary Topic
Force Microscopy Techniques and Applications
Type
article
Field-Weighted Citation Impact
1.25
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Coating of Self‐Sensing Atomic Force Microscopy Cantilevers with Boron‐Doped Nanocrystalline Diamond at Low Temperatures

Štěpán Potocký, Egor Ukraintsev, Alexander Kromka, Jaroslav Kuliček et al.
1 citations
physica status solidi (a)
Force Microscopy Techniques and Applications
1.25
article

Coating of Self‐Sensing Atomic Force Microscopy Cantilevers with Boron‐Doped Nanocrystalline Diamond at Low Temperatures

Štěpán Potocký, Egor Ukraintsev, Alexander Kromka, Jaroslav Kuliček, Bohuslav Rezek, Ondřej Novotný
article en
1 citations

Abstract

The article “Coating of Self-Sensing Atomic Force Microscopy Cantilevers with Boron-Doped Nanocrystalline Diamond at Low Temperatures” by Štěpán Potocký et al. (2400553) explores parameters of a low-temperature microwave plasma process with a smart use of microscopic temperature gradient for localized conductive diamond coating of self-sensing atomic force microscopy cantilever probes with an integrated sensing circuit. Sensitive and durable electrical current mapping by atomic force microscopy is demonstrated on micropatterned metal layers and silicon nanodevices in air and under vacuum, a highly demanded feature in the semiconductor industry.

physica status solidi (a)Vol. 222(5)
FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic (CZ), Czech Technical University in Prague (CZ)
Openalex Percentile: Top 23%
Force Microscopy Techniques and Applications
1.25
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