200mm Reconstituted Wafer for Fan-out of Microfluidics and CMOS Electronics

Wafer reconstruction uses an embedded die method by putting separated chips from different sources on a shared silicon carrier [1]–[4]. This platform enables further processing on landing wafer as a regular 200mm substrate, which provides solution to fan-out both electronics and microfluidics. This paper describes the complete process on reconstructed wafer where we accomplish the combination of active chips and microfluidics structures. This work demonstrates the potential of wafer reconstruction as an integration process platform for life science applications.

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Publication Details

Published
2024-12-03
DOI
https://doi.org/10.1109/eptc62800.2024.10909847
Citations
1
Primary Topic
3D IC and TSV technologies
Type
article
Field-Weighted Citation Impact
0.21
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200mm Reconstituted Wafer for Fan-out of Microfluidics and CMOS Electronics

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200mm Reconstituted Wafer for Fan-out of Microfluidics and CMOS Electronics

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article en
1 citations

Abstract

Wafer reconstruction uses an embedded die method by putting separated chips from different sources on a shared silicon carrier [1]–[4]. This platform enables further processing on landing wafer as a regular 200mm substrate, which provides solution to fan-out both electronics and microfluidics. This paper describes the complete process on reconstructed wafer where we accomplish the combination of active chips and microfluidics structures. This work demonstrates the potential of wafer reconstruction as an integration process platform for life science applications.

IMEC (BE)
Affordable and clean energy
Openalex Percentile: Top 43%
3D IC and TSV technologies
0.21
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